XUV / EUV X-RAY OPTICS
We offer high-quality Optical Systems from highly experienced NTT Advanced Technology Corporation, Japan.
XUV Transmission Grating UV Focusing Lens XUV Dichroic Mirrors EUV Half mirror
XUV filters EUV mirrors/X-ray mirrors EUV/X-ray focusing systems
EUV MIRRORS/X-RAY MIRRORS
Multi-layer materials and structure are customized to meet your detailed specifications, such as substrate, peak wavelength, bandwidth, and dispersion. High heat-durability multi-layer mirrors are also supported. A reflectivity evaluation service using synchrotron facilities is also available as an option.
| Application example | Substrate materials | Typical wavelength | ||
|---|---|---|---|---|
| XUV (EUV) mirror | EUV lithography High-order harmonics application Attosecond science X-ray laser |
Single layer mirror |
Mp/Si Ru/Si Zr/Al SiC/Mg Cr/C SiC Pt Ru |
50 eV ~100 eV 50 eV~100 eV 50 eV ~ 70 eV 25 eV ~50 eV ~300 eV 10 eV ~ 100 eV |
| X-ray mirror | Synchrotron applications XFEL applications Built into X-ray non-destructive inspection devices |
Multi-layer mirror ingle layer mirror |
W/C W/B4C Ru/C Pt/C C B4C SiC Cr Ni |
1 keV ~ 30 keV 1 keV ~ 30 keV |
NTT-AT provides low-cost, short lead-time, and stable-quality multi-layer mirrors for industrial applications of EUV light including EUV lithography. We are ideally positioned to support your practical use of EUVL light source developments, EUV resist developments, EUV mask inspections, and other peripheral areas as your R&D partner.
Φ10mm plane mirror EUV broadband ellipsoidal mirror(Φ100 mm zero dewer)
